Oligomeric aminoborane precursors for the chemical vapour deposition growth of few-layer hexagonal boron nitride
We explore the use of stable, pre-formed, oligomeric aminoboranes as precursors for the chemical vapour deposition growth of few-layered hexagonal boron nitride (h-BN) films on Cu foils under atmospheric pressure conditions. Dimeric diborazane H3B·NH2BH2·NH3 (DAB), and trimeric triborazane H3B·(NH2B...
| Hlavní autoři: | , , , , , , , , , , , |
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| Médium: | Journal article |
| Vydáno: |
Royal Society of Chemistry
2016
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