Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.
Citación estilo ChicagoToogood, M., M. J. Toogood, and G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
Cita MLAToogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
Warning: These citations may not always be 100% accurate.