Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.
Chicagoスタイル(17版)引用形式Toogood, M., M. J. Toogood, , G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
MLA(9版)引用形式Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
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