Dyfyniad APA

Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.

Dyfyniad Arddull Chicago

Toogood, M., M. J. Toogood, and G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.

Dyfyniad MLA

Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.

Rhybudd: Mae'n bosib nad yw'r dyfyniadau hyn bob amser yn 100% cywir.