Cita APA (7a ed.)

Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.

Cita Chicago Style (17a ed.)

Toogood, M., M. J. Toogood, y G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.

Cita MLA (9a ed.)

Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.