APA aipamena

Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.

Chicago Style aipamena

Toogood, M., M. J. Toogood, and G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.

MLA aipamena

Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.