Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.
Style de citation Chicago (17e éd.)Toogood, M., M. J. Toogood, et G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
Style de citation MLA (9e éd.)Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
Attention : ces citations peuvent ne pas être correctes à 100%.