Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.
Lua i Stíl Chicago (17ú heag.)Toogood, M., M. J. Toogood, agus G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
Lua MLA (9ú heag.)Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
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