Citazione Stile APA (7a Edizione)

Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.

Citazione stile Chigago Style (17a edizione)

Toogood, M., M. J. Toogood, e G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.

Citatione MLA (9a ed.)

Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.