APA citiranje

Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.

Chicago Style (17th ed.) Citation

Toogood, M., M. J. Toogood, and G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.

MLA citiranje

Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.