APA (7. basım) Alıntı

Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.

Chicago Style (17. basım) Atıf

Toogood, M., M. J. Toogood, ve G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.

MLA (9th ed.) Atıf

Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.