APA引文

Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.

Chicago Style (17th ed.) Citation

Toogood, M., M. J. Toogood, and G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.

MLA引文

Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.