Toogood, M., Toogood, M. J., & Hancock, G. (1991). Studies of the chemistry of plasmas used for semiconductor etching.
芝加哥风格引文Toogood, M., M. J. Toogood, 与 G. Hancock. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
MLA引文Toogood, M., et al. Studies of the Chemistry of Plasmas Used for Semiconductor Etching. 1991.
警告：这些引文格式不一定是100％准确.