Studies of the chemistry of plasmas used for semiconductor etching

Studies of the chemistry of plasmas used for semiconductor etching

<p>Optical diagnostic techniques have been developed and then used to investigate the chemistry of reactive species formed in CF<sub>4</sub> / O<sub>2</sub> rf parallel plate discharges, similar to those employed in semiconductor material processing.</p> <p>...

書誌詳細
主要な著者:	Toogood, M, M. J. Toogood
その他の著者:	Hancock, G
フォーマット:	学位論文
言語:	English
出版事項:	1991
主題:	Semiconductors Etching Plasma etching

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