Studies of the chemistry of plasmas used for semiconductor etching
<p>Optical diagnostic techniques have been developed and then used to investigate the chemistry of reactive species formed in CF<sub>4</sub> / O<sub>2</sub> rf parallel plate discharges, similar to those employed in semiconductor material processing.</p> <p>...
| 主要な著者: | , |
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| その他の著者: | |
| フォーマット: | 学位論文 |
| 言語: | English |
| 出版事項: |
1991
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| 主題: |