A theory of pad conditioning for chemical-mechanical polishing
Statistical models are presented to describe the evolution of the surface roughness of polishing pads during the pad-conditioning process in chemical-mechanical polishing. The models describe the evolution of the surface-height probability-density function of solid pads during fixed height or fixed...
Główni autorzy: | , , , , |
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Format: | Journal article |
Język: | English |
Wydane: |
2004
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