A theory of pad conditioning for chemical-mechanical polishing

Statistical models are presented to describe the evolution of the surface roughness of polishing pads during the pad-conditioning process in chemical-mechanical polishing. The models describe the evolution of the surface-height probability-density function of solid pads during fixed height or fixed...

Szczegółowa specyfikacja

Opis bibliograficzny
Główni autorzy: Borucki, L, Witelski, T, Please, C, Kramer, P, Schwendeman, D
Format: Journal article
Język:English
Wydane: 2004