A theory of pad conditioning for chemical-mechanical polishing

Statistical models are presented to describe the evolution of the surface roughness of polishing pads during the pad-conditioning process in chemical-mechanical polishing. The models describe the evolution of the surface-height probability-density function of solid pads during fixed height or fixed...

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Detalles Bibliográficos
Autores principales: Borucki, L, Witelski, T, Please, C, Kramer, P, Schwendeman, D
Formato: Journal article
Lenguaje:English
Publicado: 2004