Direct-write non-linear photolithography for semiconductor nanowire characterization.

Direct-write non-linear photolithography for semiconductor nanowire characterization.

A practical bottleneck prohibiting the rapid, confident and damage-free electrical contacting of vapour-liquid-solid grown nanowires arises from the random spatial distribution and variation in quality of the nanowires, and the contact dimensions required. Established techniques such as electron-bea...

Полное описание

Библиографические подробности
Главные авторы:	Parkinson, P, Jiang, N, Gao, Q, Tan, H, Jagadish, C
Формат:	Journal article
Язык:	English
Опубликовано:	IOP Publishing 2012

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