Direct-write non-linear photolithography for semiconductor nanowire characterization.
A practical bottleneck prohibiting the rapid, confident and damage-free electrical contacting of vapour-liquid-solid grown nanowires arises from the random spatial distribution and variation in quality of the nanowires, and the contact dimensions required. Established techniques such as electron-bea...
| Автори: | , , , , |
|---|---|
| Формат: | Journal article |
| Мова: | English |
| Опубліковано: |
IOP Publishing
2012
|