High resolution x-ray photoemission study of plasma oxidation of indium-tin-oxide thin film surfaces

The influence of plasma oxidation and other surface pretreatments on the electronic structure of indium-tin-oxide (ITO) thin films has been studied by high resolution x-ray photoemission spectroscopy. Plasma oxidation compensates n-type doping in the near surface region and leads to a reduction in t...

詳細記述

書誌詳細
主要な著者: Christou, V, Etchells, M, Renault, O, Dobson, P, Salata, O, Beamson, G, Egdell, R
フォーマット: Journal article
言語:English
出版事項: 2000