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ADSORPTION, ETCHING AND PHOTOI...
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ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
Show other versions (1)
Bibliografiske detaljer
Main Authors:
French, C
,
Jackman, R
,
Price, R
,
Foord, J
Format:
Journal article
Udgivet:
1989
Beholdninger
Beskrivelse
Other Versions (1)
Lignende værker
Medarbejdervisning
Lignende værker
Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
af: French, C, et al.
Udgivet: (1989)
REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
af: Jackman, R, et al.
Udgivet: (1986)
CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
af: Jackman, R, et al.
Udgivet: (1991)
Surface studies of the interaction of Cl2 with InP(100)(4 × 2); an investigation of adsorption, thermal etching and ion beam assisted processes
af: Murrell, A, et al.
Udgivet: (1990)
SURFACE STUDIES OF THE INTERACTION OF CL-2 WITH INP(100)(4X2) - AN INVESTIGATION OF ADSORPTION, THERMAL ETCHING AND ION-BEAM ASSISTED PROCESSES
af: Murrell, A, et al.
Udgivet: (1990)