ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
Những tác giả chính: | French, C, Jackman, R, Price, R, Foord, J |
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Định dạng: | Journal article |
Được phát hành: |
1989
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Những quyển sách tương tự
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Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
Bằng: French, C, et al.
Được phát hành: (1989) -
REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
Bằng: Jackman, R, et al.
Được phát hành: (1986) -
CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
Bằng: Jackman, R, et al.
Được phát hành: (1991) -
Surface studies of the interaction of Cl2 with InP(100)(4 × 2); an investigation of adsorption, thermal etching and ion beam assisted processes
Bằng: Murrell, A, et al.
Được phát hành: (1990) -
SURFACE STUDIES OF THE INTERACTION OF CL-2 WITH INP(100)(4X2) - AN INVESTIGATION OF ADSORPTION, THERMAL ETCHING AND ION-BEAM ASSISTED PROCESSES
Bằng: Murrell, A, et al.
Được phát hành: (1990)