ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE

Παρόμοια τεκμήρια

• Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
  ανά: French, C, κ.ά.
  Έκδοση: (1989)
• REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
  ανά: Jackman, R, κ.ά.
  Έκδοση: (1986)
• CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
  ανά: Jackman, R, κ.ά.
  Έκδοση: (1991)
• Surface studies of the interaction of Cl2 with InP(100)(4 × 2); an investigation of adsorption, thermal etching and ion beam assisted processes
  ανά: Murrell, A, κ.ά.
  Έκδοση: (1990)
• SURFACE STUDIES OF THE INTERACTION OF CL-2 WITH INP(100)(4X2) - AN INVESTIGATION OF ADSORPTION, THERMAL ETCHING AND ION-BEAM ASSISTED PROCESSES
  ανά: Murrell, A, κ.ά.
  Έκδοση: (1990)