Saltar ao contenido
VuFind
English
Deutsch
Español
Français
Italiano
日本語
Nederlands
Português
Português (Brasil)
中文(简体)
中文（繁體）
Türkçe
עברית
Gaeilge
Cymraeg
Ελληνικά
Català
Euskara
Русский
Čeština
Suomi
Svenska
polski
Dansk
slovenščina
اللغة العربية
বাংলা
Galego
Tiếng Việt
Hrvatski
हिंदी
Հայերէն
Українська
Sámegiella
Монгол
Idioma
Todos os campos
Title
Autor
Subject
Número de Clasificación
ISBN/ISSN
Tag
Buscar
Avanzado
ADSORPTION, ETCHING AND PHOTOI...
Citar
Text this
Enviar este rexistro por email
Imprimir
Exportar rexistro
Exportar a RefWorks
Exportar a EndNoteWeb
Exportar a EndNote
Permanent link
ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
Show other versions (1)
Detalles Bibliográficos
Main Authors:
French, C
,
Jackman, R
,
Price, R
,
Foord, J
Formato:
Journal article
Publicado:
1989
Existencias
Descripción
Other Versions (1)
Títulos similares
Staff View
Títulos similares
Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
por: French, C, et al.
Publicado: (1989)
REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
por: Jackman, R, et al.
Publicado: (1986)
CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
por: Jackman, R, et al.
Publicado: (1991)
Surface studies of the interaction of Cl2 with InP(100)(4 × 2); an investigation of adsorption, thermal etching and ion beam assisted processes
por: Murrell, A, et al.
Publicado: (1990)
SURFACE STUDIES OF THE INTERACTION OF CL-2 WITH INP(100)(4X2) - AN INVESTIGATION OF ADSORPTION, THERMAL ETCHING AND ION-BEAM ASSISTED PROCESSES
por: Murrell, A, et al.
Publicado: (1990)