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ADSORPTION, ETCHING AND PHOTOI...
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ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
Visa andra versioner (1)
Bibliografiska uppgifter
Huvudupphovsmän:
French, C
,
Jackman, R
,
Price, R
,
Foord, J
Materialtyp:
Journal article
Publicerad:
1989
Beståndsuppgifter
Beskrivning
Andra versioner (1)
Liknande verk
Katalogiseringsuppgifter
Liknande verk
Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
av: French, C, et al.
Publicerad: (1989)
REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
av: Jackman, R, et al.
Publicerad: (1986)
CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
av: Jackman, R, et al.
Publicerad: (1991)
Surface studies of the interaction of Cl2 with InP(100)(4 × 2); an investigation of adsorption, thermal etching and ion beam assisted processes
av: Murrell, A, et al.
Publicerad: (1990)
SURFACE STUDIES OF THE INTERACTION OF CL-2 WITH INP(100)(4X2) - AN INVESTIGATION OF ADSORPTION, THERMAL ETCHING AND ION-BEAM ASSISTED PROCESSES
av: Murrell, A, et al.
Publicerad: (1990)