Rapid patterning of single-wall carbon nanotubes by interlayer lithography.
High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a g...
| Main Authors: | , , , , , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2010
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| _version_ | 1797101751409573888 |
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| author | Leem, D Kim, S Kim, J Sohn, J Edwards, A Huang, J Wang, X Kim, J Bradley, D Demello, J |
| author_facet | Leem, D Kim, S Kim, J Sohn, J Edwards, A Huang, J Wang, X Kim, J Bradley, D Demello, J |
| author_sort | Leem, D |
| collection | OXFORD |
| description | High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells. Copyright © 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim. |
| first_indexed | 2024-03-07T05:56:18Z |
| format | Journal article |
| id | oxford-uuid:eaa0bccf-3182-4b0b-8941-677e07a9693b |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-07T05:56:18Z |
| publishDate | 2010 |
| record_format | dspace |
| spelling | oxford-uuid:eaa0bccf-3182-4b0b-8941-677e07a9693b2022-03-27T11:03:37ZRapid patterning of single-wall carbon nanotubes by interlayer lithography.Journal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:eaa0bccf-3182-4b0b-8941-677e07a9693bEnglishSymplectic Elements at Oxford2010Leem, DKim, SKim, JSohn, JEdwards, AHuang, JWang, XKim, JBradley, DDemello, JHigh resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells. Copyright © 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim. |
| spellingShingle | Leem, D Kim, S Kim, J Sohn, J Edwards, A Huang, J Wang, X Kim, J Bradley, D Demello, J Rapid patterning of single-wall carbon nanotubes by interlayer lithography. |
| title | Rapid patterning of single-wall carbon nanotubes by interlayer lithography. |
| title_full | Rapid patterning of single-wall carbon nanotubes by interlayer lithography. |
| title_fullStr | Rapid patterning of single-wall carbon nanotubes by interlayer lithography. |
| title_full_unstemmed | Rapid patterning of single-wall carbon nanotubes by interlayer lithography. |
| title_short | Rapid patterning of single-wall carbon nanotubes by interlayer lithography. |
| title_sort | rapid patterning of single wall carbon nanotubes by interlayer lithography |
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