Atom probe Tomography of fast-diffusing impurities and the effect of gettering in multicrystalline silicon
This article demonstrates an approach for multiscale characterisation of individual defects, such as grain boundaries, in multicrystalline silicon. The analysis techniques range from macroscale characterisation of average bulk lifetime, through photoluminescence to resolve spatial recombination, and...
Үндсэн зохиолчид: | Tweddle, D, Shaw, E, Douglas, J, Bonilla, R, Moody, M, Hamer, P, Wilshaw, P |
---|---|
Формат: | Conference item |
Хэвлэсэн: |
AIP Publishing
2018
|
Ижил төстэй зүйлс
-
Specimen preparation methods for elemental characterisation of grain boundaries and isolated dislocations in multicrystalline silicon using atom probe tomography
-н: Lotharukpong, C, зэрэг
Хэвлэсэн: (2017) -
Direct observation of hydrogen at defects in multicrystalline silicon
-н: Tweddle, D, зэрэг
Хэвлэсэн: (2019) -
Porous silicon and aluminum co-gettering experiment in p-type multicrystalline silicon substrate
-н: P.N. Vinod
Хэвлэсэн: (2007-01-01) -
Sacrificial high-temperature phosphorus diffusion gettering for lifetime improvement of multicrystalline silicon wafers
-н: Scott, Stephanie Morgan
Хэвлэсэн: (2014) -
High-Performance and Traditional Multicrystalline Silicon: Comparing Gettering Responses and Lifetime-Limiting Defects
-н: Ekstrom, Kai E., зэрэг
Хэвлэсэн: (2018)