ATOM-PROBE FIELD-ION MICROSCOPE STUDIES OF PALLADIUM SILICIDE ON SILICON
Palladium silicide coated silicon specimens have been formed by thermally evaporating palladium onto clean field evaporated n-type silicon (100) tips. The thin palladium overlayer is reacted to form palladium silicide by thermal annealing at 675 K. The tips were studied by field ion imaging, pulsed...
| Main Authors: | , , , |
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| Format: | Conference item |
| Published: |
1995
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