Sub-wavelength Al mask apertures for addressing individual InGaN quantum dots
We describe a lithographic process for the fabrication of small size optical apertures, together with large alignment marks to locate the aperture position during measurements in an optical cryostat. The aperture size is chosen to isolate a small number of dots from a dense self-assembled array of I...
| Main Authors: | , , , |
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| Format: | Conference item |
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2004
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