Carbon nanotube nanoelectronic devices compatible with transmission electron microscopy.

We report on a novel method to fabricate carbon nanotube (CNT) nanoelectronic devices on silicon nitride membrane grids that are compatible with high resolution transmission electron microscopy (HRTEM). Resist-based electron beam lithography is used to fabricate electrodes on 50 nm thin silicon nitr...

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Bibliographic Details
Main Authors: Wang, H, Luo, J, Schäffel, F, Rümmeli, M, Briggs, G, Warner, J
Format: Journal article
Language:English
Published: 2011