EFFECTS OF HIGH UNIAXIAL STRESS ON FAR INFRA-RED IMPURITY SPECTRA OF HIGH-PURITY NORMAL-TYPE AND PARA-TYPE SILICON

EFFECTS OF HIGH UNIAXIAL STRESS ON FAR INFRA-RED IMPURITY SPECTRA OF HIGH-PURITY NORMAL-TYPE AND PARA-TYPE SILICON

Bibliographic Details
Main Authors: Cooke, R, Nicholas, R, Stradling, R, Portal, J, Askenazy, S
Format: Journal article
Published: 1978

Similar Items