Au/nc-Si:H core–shell nanostructures prepared by hot wire assisted plasma enhanced chemical vapor deposition technique
In this study, Au film was embedded in Si:H film on quartz substrate with and without an SiOx layer by using the hot wire assisted plasma enhanced chemical vapor deposition (HW-PECVD) technique. The as-prepared Au/Si:H films were post-thermally annealed at 800 °C in nitrogen ambient in order to in...
| Principais autores: | , , , |
|---|---|
| Formato: | Artigo |
| Idioma: | English |
| Publicado em: |
Elsevier
2012
|
| Assuntos: | |
| Acesso em linha: | http://eprints.um.edu.my/10637/1/00006469_91281.pdf |