Comparison of oxidized/nitrided Zr thin films on Si and SiC substrates
This work utilizes simultaneous thermal oxidation and nitridation technique to transform sputtered Zr to ZrO2 and to Zr-oxynitride thin films on Si and SiC substrates, respectively, in nitrous oxide gas ambient. Various characterization techniques such as X-ray photoelectron spectroscopy, energy-fil...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Published: |
Elsevier
2013
|
| Subjects: |