Physical and dispersive optical characteristics of ZrON/Si thin-film system
To date, the complex evaluation of physical and dispersive optical characteristics of the ZrON/Si film system has yet been reported. Hence, ZrON thin films have been formed on Si(100) substrates through oxidation/nitridation of sputtered metallic Zr in N2O environment at 500, 700, and 900 ∘C. Physic...
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| Format: | Article |
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Springer
2014
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| author | Wong, Yew Hoong Atuchin, V.V. Kruchinin, V.N. Cheong, K.Y. |
| author_facet | Wong, Yew Hoong Atuchin, V.V. Kruchinin, V.N. Cheong, K.Y. |
| author_sort | Wong, Yew Hoong |
| collection | UM |
| description | To date, the complex evaluation of physical and dispersive optical characteristics of the ZrON/Si film system has yet been reported. Hence, ZrON thin films have been formed on Si(100) substrates through oxidation/nitridation of sputtered metallic Zr in N2O environment at 500, 700, and 900 ∘C. Physical properties of the deposited films have been characterized by X-ray diffractometry (XRD), Fourier transform infrared (FTIR) spectroscopy, reflection high-energy electron diffraction (RHEED), and spectroscopic ellipsometry (SE). It has been shown that ZrON/Si thin films without optical absorption can be prepared by oxidation/nitridation reaction in N2O environment at 700–900 ∘C. |
| first_indexed | 2024-03-06T05:32:41Z |
| format | Article |
| id | um.eprints-13018 |
| institution | Universiti Malaya |
| last_indexed | 2024-03-06T05:32:41Z |
| publishDate | 2014 |
| publisher | Springer |
| record_format | dspace |
| spelling | um.eprints-130182019-08-06T04:22:12Z http://eprints.um.edu.my/13018/ Physical and dispersive optical characteristics of ZrON/Si thin-film system Wong, Yew Hoong Atuchin, V.V. Kruchinin, V.N. Cheong, K.Y. TA Engineering (General). Civil engineering (General) To date, the complex evaluation of physical and dispersive optical characteristics of the ZrON/Si film system has yet been reported. Hence, ZrON thin films have been formed on Si(100) substrates through oxidation/nitridation of sputtered metallic Zr in N2O environment at 500, 700, and 900 ∘C. Physical properties of the deposited films have been characterized by X-ray diffractometry (XRD), Fourier transform infrared (FTIR) spectroscopy, reflection high-energy electron diffraction (RHEED), and spectroscopic ellipsometry (SE). It has been shown that ZrON/Si thin films without optical absorption can be prepared by oxidation/nitridation reaction in N2O environment at 700–900 ∘C. Springer 2014-06 Article PeerReviewed Wong, Yew Hoong and Atuchin, V.V. and Kruchinin, V.N. and Cheong, K.Y. (2014) Physical and dispersive optical characteristics of ZrON/Si thin-film system. Applied Physics A, 115 (3). pp. 1069-1072. ISSN 0947-8396, DOI https://doi.org/10.1007/s00339-013-7947-1 <https://doi.org/10.1007/s00339-013-7947-1>. https://doi.org/10.1007/s00339-013-7947-1 doi:10.1007/s00339-013-7947-1 |
| spellingShingle | TA Engineering (General). Civil engineering (General) Wong, Yew Hoong Atuchin, V.V. Kruchinin, V.N. Cheong, K.Y. Physical and dispersive optical characteristics of ZrON/Si thin-film system |
| title | Physical and dispersive optical characteristics of ZrON/Si thin-film system |
| title_full | Physical and dispersive optical characteristics of ZrON/Si thin-film system |
| title_fullStr | Physical and dispersive optical characteristics of ZrON/Si thin-film system |
| title_full_unstemmed | Physical and dispersive optical characteristics of ZrON/Si thin-film system |
| title_short | Physical and dispersive optical characteristics of ZrON/Si thin-film system |
| title_sort | physical and dispersive optical characteristics of zron si thin film system |
| topic | TA Engineering (General). Civil engineering (General) |
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