Crystallinity and Si-H bonding configuration of nc-Si:H films grown by Layer-by-layer (LBL) deposition technique at different RF power
A set of hydrogenated nanocrystalline silicon (nc-Si:H) films prepared in a home built plasma enhanced chemical vapour deposition (PECVD) system using the layer by- layer (LBL) deposition technique have been studied. The 13.56 MHz RF power was varied from 20 to 100 W to study the influence of RF po...
| Principais autores: | , , |
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| Formato: | Conference or Workshop Item |
| Idioma: | English |
| Publicado em: |
2007
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| Assuntos: | |
| Acesso em linha: | http://eprints.um.edu.my/13516/1/0001.pdf |