Structural characteristics of samarium oxynitride on silicon substrate
Thermal oxynitridation of 20 nm sputtered pure samarium metal film on silicon substrates were carried out in nitrous oxide gas ambient at various temperatures (600–900 °C) for 15 min. Influences of the oxynitridation temperature on the structural and chemical properties of the SmxOyNz films had been...
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Elsevier
2017
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