Experimental investigations of the effect of the neutral gas pressure on the separate control of ion energy and flux in dual frequency capacitively coupled plasmas

Classical dual-frequency capacitively coupled plasmas (2f CCPs) operating at low pressures and significantly different frequencies are often used for a variety of applications in semiconductor manufacturing in order to control the mean ion energy at the electrodes separately from the ion flux. Howev...

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Bibliographic Details
Main Authors: Saikia, Partha, Bhuyan, Heman, Yap, Seong Ling, Escalona, Miguel, Favre, Mario, Wyndham, Edmund, Schulze, Julian
Format: Article
Published: AIP Publishing 2019
Subjects: