Experimental investigations of the effect of the neutral gas pressure on the separate control of ion energy and flux in dual frequency capacitively coupled plasmas
Classical dual-frequency capacitively coupled plasmas (2f CCPs) operating at low pressures and significantly different frequencies are often used for a variety of applications in semiconductor manufacturing in order to control the mean ion energy at the electrodes separately from the ion flux. Howev...
Main Authors: | Saikia, Partha, Bhuyan, Heman, Yap, Seong Ling, Escalona, Miguel, Favre, Mario, Wyndham, Edmund, Schulze, Julian |
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Format: | Article |
Published: |
AIP Publishing
2019
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Subjects: |
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