Ammonia flux tailoring on the quality of AlN epilayers grown by pulsed atomic-layer epitaxy techniques on (0 0 0 1)-oriented sapphire substrates via MOCVD
A smooth and dense surface of single-crystalline aluminium nitride thin films has been epitaxially grown on (0 0 0 1)-sapphire substrates by tailoring and optimizing the ammonia flux density during deposition. The aluminium nitride films were deposited by metal organic chemical vapour deposition usi...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Published: |
Royal Society of Chemistry
2019
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| Subjects: |