Influence of substrate temperatures on structural, morphological and optical properties of rf-sputtered anatase TiO2 films
In this investigation, TiO2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 degrees C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO2 films were characterized by x-ray diffraction...
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Format: | Article |
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2010
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