Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films
TiO2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The struc...
| Main Authors: | , , , , |
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| Format: | Article |
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Elsevier
2010
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