Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering
In this investigation, anatase TiO 2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. The TiO 2 films deposited at room temperature were annealed at different temperatures up to 873°K for 1 h. The TiO 2 films we...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Published: |
Asian Network for Scientific Information
2009
|
| Subjects: |
| _version_ | 1825719274551902208 |
|---|---|
| author | Hasan, M.M. Haseeb, A.S. Md. Abdul Saidur, Rahman Masjuki, Haji Hassan Hamdi, M. |
| author_facet | Hasan, M.M. Haseeb, A.S. Md. Abdul Saidur, Rahman Masjuki, Haji Hassan Hamdi, M. |
| author_sort | Hasan, M.M. |
| collection | UM |
| description | In this investigation, anatase TiO 2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. The TiO 2 films deposited at room temperature were annealed at different temperatures up to 873°K for 1 h. The TiO 2 films were characterized by X-Ray Diffraction (XRD), Field-Emission Scanning Electron Microscopy (FESEM). Atomic Force Microscopy (AFM) and UV-visible-NIR spectrophotometry. The XRD results reveal that the as-deposited film possess the anatase structure. Annealed TiO 2 films show an insignificant change in crystallinity except of the fact that there is a slight increase for the film annealed at 600°C. The crystallite size increases from 44.5 to 48 nm with the increase of the annealing temperature. As-grown TiO 2 film exhibits high visible transmittance with enhanced refractive index of 2.31 at a wavelength of 550 nm. The indirect optical band gaps of the as-deposited and annealed films have been estimated to be in the range of 3.39-3.42 eV. AFM observations reveal the compact and dense morphology of the as-deposited and annealed TiO 2 thin films. |
| first_indexed | 2024-03-06T05:17:10Z |
| format | Article |
| id | um.eprints-6791 |
| institution | Universiti Malaya |
| last_indexed | 2024-03-06T05:17:10Z |
| publishDate | 2009 |
| publisher | Asian Network for Scientific Information |
| record_format | dspace |
| spelling | um.eprints-67912020-07-21T07:32:46Z http://eprints.um.edu.my/6791/ Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering Hasan, M.M. Haseeb, A.S. Md. Abdul Saidur, Rahman Masjuki, Haji Hassan Hamdi, M. TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery In this investigation, anatase TiO 2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. The TiO 2 films deposited at room temperature were annealed at different temperatures up to 873°K for 1 h. The TiO 2 films were characterized by X-Ray Diffraction (XRD), Field-Emission Scanning Electron Microscopy (FESEM). Atomic Force Microscopy (AFM) and UV-visible-NIR spectrophotometry. The XRD results reveal that the as-deposited film possess the anatase structure. Annealed TiO 2 films show an insignificant change in crystallinity except of the fact that there is a slight increase for the film annealed at 600°C. The crystallite size increases from 44.5 to 48 nm with the increase of the annealing temperature. As-grown TiO 2 film exhibits high visible transmittance with enhanced refractive index of 2.31 at a wavelength of 550 nm. The indirect optical band gaps of the as-deposited and annealed films have been estimated to be in the range of 3.39-3.42 eV. AFM observations reveal the compact and dense morphology of the as-deposited and annealed TiO 2 thin films. Asian Network for Scientific Information 2009 Article PeerReviewed Hasan, M.M. and Haseeb, A.S. Md. Abdul and Saidur, Rahman and Masjuki, Haji Hassan and Hamdi, M. (2009) Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering. Journal of Applied Sciences, 9 (15). pp. 2815-2821. ISSN 1812-5654, DOI https://doi.org/10.3923/jas.2009.2815.2821 <https://doi.org/10.3923/jas.2009.2815.2821>. https://doi.org/10.3923/jas.2009.2815.2821 doi:10.3923/jas.2009.2815.2821 |
| spellingShingle | TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery Hasan, M.M. Haseeb, A.S. Md. Abdul Saidur, Rahman Masjuki, Haji Hassan Hamdi, M. Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering |
| title | Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering |
| title_full | Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering |
| title_fullStr | Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering |
| title_full_unstemmed | Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering |
| title_short | Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering |
| title_sort | synthesis and annealing of nanostructured tio2 films by radio frequency magnetron sputtering |
| topic | TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery |
| work_keys_str_mv | AT hasanmm synthesisandannealingofnanostructuredtio2filmsbyradiofrequencymagnetronsputtering AT haseebasmdabdul synthesisandannealingofnanostructuredtio2filmsbyradiofrequencymagnetronsputtering AT saidurrahman synthesisandannealingofnanostructuredtio2filmsbyradiofrequencymagnetronsputtering AT masjukihajihassan synthesisandannealingofnanostructuredtio2filmsbyradiofrequencymagnetronsputtering AT hamdim synthesisandannealingofnanostructuredtio2filmsbyradiofrequencymagnetronsputtering |