Effect of pre-deposited carbon layer on the formation of carbon nitride nanostructures prepared by radio-frequency plasma enhanced chemical vapour deposition
Nanostructured carbon nitride (CN(x)) thin films were prepared by radio-frequency plasma enhanced chemical vapour deposition (rf-PECVD) on crystal silicon (c-Si) substrates coated with a layer of hydrogenated amorphous carbon (a-C:H). The a-C:H layer was deposited by rf-PECVD from the discharge of p...
| Main Authors: | , , , , , , |
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| Format: | Article |
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Elsevier
2011
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