Highly reflective nc-Si:H/a-CNx:H multilayer films prepared by r.f. PECVD technique
Multilayer thin films consisting of a-CNx:H/nc-Si:H layers prepared by radio-frequency plasma enhanced chemical vapour (r.f, PECVD) deposition technique were studied. High optical reflectivity at a specific wavelength is one of major concern for its application. By using this technique, a-CNx:H/nc-S...
| Main Authors: | , , , , |
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| Format: | Article |
| Published: |
2009
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| Subjects: |