Influence of film thickness on the structural, electrical and photoluminescence properties of vacuum deposited Alq(3) thin films on c-silicon substrate
In this work. the influence of film thickness on the structural, electrical and photoluminescence (PL) properties of tris (8-hydroxyquinoline) aluminum (Alq(3)) films prepared by vacuum evaporation technique on crystal silicon (c-Si) substrate were studied. Fourier transform infrared (FTIR) spectros...
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| Format: | Article |
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2009
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