Infrared and raman spectroscopy studies on pulsed PECVD a-Si:H Films
This work presents a study on the structural properties of hydrogenated amorphous silicon (a-Si:H) prepared by pulsed plasma enhanced chemical vapour deposition (PECVD) technique using Raman and infrared spectroscopy. The bonded hydrogen content and hydrogen bonding configurations in the a-Si:H film...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
2007
|
| Subjects: | |
| Online Access: | http://eprints.um.edu.my/7362/1/Infrared_and_Raman_Spectroscopy_Studies_on_Pulsed_PECVD_a-SiH_Films.pdf |