Multi-phase structured silicon carbon nitride thin films prepared by hot-wire chemical vapour deposition
In this work, Silicon Carbon Nitride (Si-C-N) thin films were deposited by Hot Wire Chemical Vapour Deposition (HWCVD) technique from a gas mixture of silane (SiH4), methane (CH4) and nitrogen (N-2). Six sets of Si-C-N thin films were produced and studied. The component gas flow rate ratio (SiH4:CH4...
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| Format: | Article |
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2011
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