Silicon nanostructures fabricated by Au and SiH4 co-deposition technique using hot-wire chemical vapor deposition
In this study, the fabrication of Si nanostructures by Au and SiH4 co-deposition technique using hot-wire chemical vapor deposition was demonstrated. A high deposition rate of 2.7 nm/s and a high density of silicon nanostructures with a diameter of about 140 nm were obtained at T-s of 250 degrees C....
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Published: |
2011
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| Subjects: |