Energy distributions of copper ions and atoms sputtered by atomic and molecular ions

Non-resonant multiphoton ionization combined with quadrupole and time-of-flight analysis has been used to study sputtering by both atomic and molecular ion beams. The mass spectra and energy distributions of both sputtered atoms and secondary ions produced by 3.6 keV Ar+, N+, N-2(+), CF2+ and CF3+ i...

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Main Authors: Wang, L., Nor, R.M., Graham, W.G.
Format: Article
Published: Institute of Physics 1997
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author Wang, L.
Nor, R.M.
Graham, W.G.
author_facet Wang, L.
Nor, R.M.
Graham, W.G.
author_sort Wang, L.
collection UM
description Non-resonant multiphoton ionization combined with quadrupole and time-of-flight analysis has been used to study sputtering by both atomic and molecular ion beams. The mass spectra and energy distributions of both sputtered atoms and secondary ions produced by 3.6 keV Ar+, N+, N-2(+), CF2+ and CF3+ ion bombardment at 45 degrees to a polycrystalline copper target have been measured. The energy distributions of the copper ions and atoms are found to be different and quite complex. The ion distributions can generally be described by a linear collision cascade model, with possible evidence for a knock-on contribution. The sputtered atom distributions are partially described by a combination of linear collision cascade and dense cascade (thermal spike) models. This is interpreted as support for a time-evolving sputtering mechanism.
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spelling um.eprints-78652017-07-10T03:55:16Z http://eprints.um.edu.my/7865/ Energy distributions of copper ions and atoms sputtered by atomic and molecular ions Wang, L. Nor, R.M. Graham, W.G. QC Physics Non-resonant multiphoton ionization combined with quadrupole and time-of-flight analysis has been used to study sputtering by both atomic and molecular ion beams. The mass spectra and energy distributions of both sputtered atoms and secondary ions produced by 3.6 keV Ar+, N+, N-2(+), CF2+ and CF3+ ion bombardment at 45 degrees to a polycrystalline copper target have been measured. The energy distributions of the copper ions and atoms are found to be different and quite complex. The ion distributions can generally be described by a linear collision cascade model, with possible evidence for a knock-on contribution. The sputtered atom distributions are partially described by a combination of linear collision cascade and dense cascade (thermal spike) models. This is interpreted as support for a time-evolving sputtering mechanism. Institute of Physics 1997 Article PeerReviewed Wang, L. and Nor, R.M. and Graham, W.G. (1997) Energy distributions of copper ions and atoms sputtered by atomic and molecular ions. Journal of Physics D: Applied Physics, 30 (17). pp. 2379-2388. ISSN 0022-3727, DOI https://doi.org/10.1088/0022-3727/30/17/003 <https://doi.org/10.1088/0022-3727/30/17/003>. 10.1088/0022-3727/30/17/003
spellingShingle QC Physics
Wang, L.
Nor, R.M.
Graham, W.G.
Energy distributions of copper ions and atoms sputtered by atomic and molecular ions
title Energy distributions of copper ions and atoms sputtered by atomic and molecular ions
title_full Energy distributions of copper ions and atoms sputtered by atomic and molecular ions
title_fullStr Energy distributions of copper ions and atoms sputtered by atomic and molecular ions
title_full_unstemmed Energy distributions of copper ions and atoms sputtered by atomic and molecular ions
title_short Energy distributions of copper ions and atoms sputtered by atomic and molecular ions
title_sort energy distributions of copper ions and atoms sputtered by atomic and molecular ions
topic QC Physics
work_keys_str_mv AT wangl energydistributionsofcopperionsandatomssputteredbyatomicandmolecularions
AT norrm energydistributionsofcopperionsandatomssputteredbyatomicandmolecularions
AT grahamwg energydistributionsofcopperionsandatomssputteredbyatomicandmolecularions