TiO2 Nanoparticles Prepared by MOCVD: Effect of Temperature, Flowrate, and Precursor.
Titanium dioxide nanoparticles were produced by metal organic chemical vapour deposition method. The effect of deposition temperatures (400–900 °C), flowrates of the carrier gas (200–600 mL/min), and the precursors [titanium (IV) butoxide (TBOT) and titanium tetraisopropoxide (TTIP)] on the particle...
| Príomhchruthaitheoirí: | , , , |
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| Formáid: | Alt |
| Teanga: | English |
| Foilsithe / Cruthaithe: |
2013
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