A method for depositing tin oxide film.
The present invention relates to a method for depositing tin oxide film on a substrate comprises of providing a substrate; preparing a precursor solution comprises of metal dichloride, hydrogen peroxide and a complexing agent; adjusting the precursor solution at a predetermined pH; maintaining the p...
| Main Authors: | , , , |
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| Format: | Patent |
| Language: | English |
| Published: |
2011
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| _version_ | 1825948028920397824 |
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| author | Wan Yunus, Wan Md. Zin Ebrahimiasl, Saeideh Kassim, Anuar Zainal, Zulkarnain |
| author_facet | Wan Yunus, Wan Md. Zin Ebrahimiasl, Saeideh Kassim, Anuar Zainal, Zulkarnain |
| author_sort | Wan Yunus, Wan Md. Zin |
| collection | UPM |
| description | The present invention relates to a method for depositing tin oxide film on a substrate comprises of providing a substrate; preparing a precursor solution comprises of metal dichloride, hydrogen peroxide and a complexing agent; adjusting the precursor solution at a predetermined pH; maintaining the precursor solution at a predetermined temperature; immersing; and drying the substrate. The tin oxide film is deposited on the substrate by chemical bath deposition at a room temperature. |
| first_indexed | 2024-03-06T08:22:26Z |
| format | Patent |
| id | upm.eprints-32117 |
| institution | Universiti Putra Malaysia |
| language | English |
| last_indexed | 2024-03-06T08:22:26Z |
| publishDate | 2011 |
| record_format | dspace |
| spelling | upm.eprints-321172014-10-16T03:20:19Z http://psasir.upm.edu.my/id/eprint/32117/ A method for depositing tin oxide film. Wan Yunus, Wan Md. Zin Ebrahimiasl, Saeideh Kassim, Anuar Zainal, Zulkarnain The present invention relates to a method for depositing tin oxide film on a substrate comprises of providing a substrate; preparing a precursor solution comprises of metal dichloride, hydrogen peroxide and a complexing agent; adjusting the precursor solution at a predetermined pH; maintaining the precursor solution at a predetermined temperature; immersing; and drying the substrate. The tin oxide film is deposited on the substrate by chemical bath deposition at a room temperature. 2011-04-21 Patent NonPeerReviewed Wan Md. Zin Wan Yunus (2011) A method for depositing tin oxide film. PI2011001802. English |
| spellingShingle | Wan Yunus, Wan Md. Zin Ebrahimiasl, Saeideh Kassim, Anuar Zainal, Zulkarnain A method for depositing tin oxide film. |
| title | A method for depositing tin oxide film. |
| title_full | A method for depositing tin oxide film. |
| title_fullStr | A method for depositing tin oxide film. |
| title_full_unstemmed | A method for depositing tin oxide film. |
| title_short | A method for depositing tin oxide film. |
| title_sort | method for depositing tin oxide film |
| work_keys_str_mv | AT wanyunuswanmdzin amethodfordepositingtinoxidefilm AT ebrahimiaslsaeideh amethodfordepositingtinoxidefilm AT kassimanuar amethodfordepositingtinoxidefilm AT zainalzulkarnain amethodfordepositingtinoxidefilm AT wanyunuswanmdzin methodfordepositingtinoxidefilm AT ebrahimiaslsaeideh methodfordepositingtinoxidefilm AT kassimanuar methodfordepositingtinoxidefilm AT zainalzulkarnain methodfordepositingtinoxidefilm |